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Film Thickness Measurement
Brand ：KLA-Filmetrics
Model ：F40
Keywords ：Filmetrics,Film thickness meter, film thickness
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KLA's Filmetrics series ,using spectral reflection technology to accurately measure the  film thickness ranging from nm to mm,which realize the thickness measurement of photoresist, oxide, silicon or other semiconductor films, organic films, conductive transparent films and other thin films. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has f10-HC, F20, F32, F40, F50, f60-t and other products. It can measure samples from several mm to 450mm, and the film thickness can be measured from 1nm to mm. F40 is used to measure the thickness of film which light spot is less than 1µm.

Principle of measurement - spectral reflection

Spectral ellipsometer (SE) and spectral reflector (SR) both use reflected light to determine the thickness and refractive index of dielectric, semiconductor, and metallic films. The main difference between the two is that the ellipsometer measures light reflected from the film at a small angle, while the spectral reflector measures light reflected vertically from the film. Spectral reflectors measure vertical light and ignore polarization effects (most films are rotationally symmetric). Duing to no mobile devices are involved, spectral reflectors are simple and low-cost. Spectral reflectometer can be easily integrated into a more powerful transmittance analysis. Spectral reflectometer is usually preferred for thin films thicker than 10um, while ellipsometer focuses on films thinner than 10nm. Both techniques can be used for the thickness between 10nm and 10um . Moreover, a fast, simple and low-cost spectral reflector is usually a better choice.