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  SHNTI的氮化硅薄膜窗口是一款价格非常优惠的产品,应用也非常广泛。它可以应用在TEM、X-Ray、SEM等等分析测试上。


  在TEM上,可以完全避免碳膜的背景影响;在X-Ray上能够实现软X-射线(如真空紫外线)的最大透射率。特别在“离轴”状态工作(即薄膜与光束成一定角度)时,也需要较薄的薄膜窗口,便于X射线的更好穿透。
  现有技术一般采用计量式或ST氮化硅薄膜,但ST薄膜具有较高的残余应力,不够结实,容易破裂。SHNTI提供的氮化硅薄膜窗口是一种低应力的承载工具(也可以作为微型培养皿、支撑膜),改进了原有技术的缺陷。SHNTI提供的氮化硅薄膜窗口具有良好的透光性、平整性、耐高温、化学惰性、亲水性、实用性、稳定性等。

  The Silicon Nitride film window of SHNTI is the most cost-effective products, its applications is very wide. It could use for analysis like TEM、X-Ray、SEM and so on.It can completely avoid the background of carbon when it be used at TEM analysis.

  Silicon nitride film window used in the X-Ray can be achieved maximum transmission rate of soft X-ray (such as vacuum ultraviolet). The softer X-ray, the lower energy ,the worse penetrating it could have, so that it required thinner silicon nitride window. Especially in the “off-axis” work module (i.e. film and beam at a certain angle),we also need thinner film window, and better X-Ray penetration.

  Commonly measurement of existing technology or ST Silicon nitride film, although it has a high residual stress to the ST film, they are not strong enough, and easy to break. Based on the needs of X-ray microscopy and transmission imaging, Silicon nitride film on the soft X-ray must satisfy the smaller absorption. The Silicon nitride film windows supplied by SHNTI are low stress load tools (also available as mini-dish, support film), that improved the shortcomings of the original technology.

acteristics Silicon nitride film windows of SHNTI:

1、The transmittance

In estimating the transmission performance of the film, the absorption line should be noticed, if it’s necessary to consider the optical properties, absorption limit should be lower than 13nm. When the absorption limit is 13nm,100nm thick film transmittance is 44%; When the absorption limit is 2.4nm, the light transmission decline to 13%.

2、Flatness

Silicon nitride film window film is smooth, strength, density is good, very stable surface smoothness (roughness less than 1nm). Normally there’s no negative effect for the application. We can see that the surface of silicon nitride thin film situation by the AFM testing.

3、Temperature

The products can be used in high temperature areas, it is able to withstand 1000 degree centigrade heating, It’s very suitable for the surface of a silicon wafer substrates grown by CVD using a variety of nano-materials.

4、chemically inert

No reaction with other inorganic acids , except HF.

5、Hydrophilic

SHNTI silicon nitride film window does not have the hydrophilic nature itself,                                    

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